Pulsed plasma deposition of chromium oxide/chromium-cermet coatings

2019-05-24 08:41:24

Deposition ray situ oxide chromium

责任者: Gall, D.;Gampp, R.;Lang, H.P.;Oelhafen, P. 单位: Univ of Basel, Basel, Switz 来源出处: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,1996,14(2):374-379 摘要: A novel radio frequency magnetron sputtering method for the deposition of composite films which consist of chromium oxide and chromium (Cr2O3/Cr-cermet) is presented. As an extension to conventional reactive sputtering of a Cr target in an argon and oxygen atmosphere the oxygen flow into the process chamber is switched periodically on and off. This leads to an oscillating oxygen partial pressure during the sputtering process and an alternating deposition of metallic chromium and chromium oxide. In situ x-ray and ultraviolet photoelectron spectroscopy are used to monitor the oxidation state of chromium at the film surface and to study the chemical interactions between adjacent layers. Ex situ x-ray diffraction analysis reveals the multilayered and nanocrystalline structure of the deposited films. The overall chromium and chromium oxide concentration is estimated from the optical constants n and k determined by reflectance and transmission measurements in the wavelength range between 400 and 2200 nm. 关键词: Coatings;Cermets;Sputter deposition;Magnetron sputtering;Plasma applications;Chromium;Chromium compounds;X ray photoelectron spectroscopy;Ultraviolet spectroscopy;Oxidation;X ray diffraction analysis;Crystal structure;Nanostructured materials;Cermet coatings;Chromium oxide;Pulsed plasma deposition;In situ;Ex situ