Microstructural evolution of a silicon oxide phase in a perfluorosulfonic acid i

2019-05-13 05:07:10

small acid silicon ray oxide

责任者: Mauritz, K.A.;Stefanithis, I.D.;Davis, S.V.;Scheetz, R.W.;Pope, R.K.;Wilkes, Garth L.;Huang, Hao-Hsin 单位: Univ of Southern Mississippi, Hattiesburg, MS, USA 来源出处: Journal of Applied Polymer Science,1995,55(1):181-190 摘要: Nanocomposites were produced via sol-gel reactions for tetraethylorthosilicate within the cluster morphology of perfluorosulfonic acid films. Small-angle x-ray scattering revealed that the polar/nonpolar nanophase-separated morphological template persists despite invasion by the silicon oxide phase. Scanning electron microscopy (ESEM-EDAX) studies have indicated that the greatest silicon oxide concentration occurs near the surface and decreases to a minimum in the middle. Optical and ESEM micrographs revealed a brittle, surface-attached silica layer at high silicon oxide contents. 关键词: Ionomers;Silicates;Nanostructured materials;Sol-gels;Morphology;Phase separation;Scanning electron microscopy;X ray analysis;Surfaces;Silica;Composition effects;Plastic films;Microstructure;Perfluorosulfonic acid ionomers;Tetraethylorthosilicate;Small angle X ray scattering;Energy dispersive analysis of X rays (EDAX)