LIGHT-EMISSION FROM SILICON NANOSTRUCTURES PRODUCED BY CONVENTIONAL LITHOGRAPHIC

2020-04-05 18:08:58

antigen using silicon Athens

责任者: NASSIOPOULOS, AG;GRIGOROPOULOS, S;PAPADIMITRIOU, D;GOGOLIDES, E 单位: NATL TECH UNIV ATHENS,DEPT PHYS,GR-15310 ATHENS,GREECE. 来源出处: PHYSICA STATUS SOLIDI B-BASIC RESEARCH, v 190, JUL 1995, p 91- 95 摘要: Sub-ten nanometer diameter silicon pillars and silicon walls of the same thickness are Fabricated by using conventional optical lithography based on deep-UV exposure and reactive ion etching using fluorine only containing gases. The produced structures are studied for their luminescence properties. Visible photoluminescence with a peak in the range 580 to 650 nm is observed under Ar laser irradiation. 关键词: MONOCLONAL ANTIBODY; COLORECTAL CANCER; LEUKOCYTE ADHERENCE INHIBITION; CARCINOEMBRYONIC ANTIGEN CARCINOEMBRYONIC ANTIGEN; FABRICATION