Surface oxide reduction and bilayer molecular assembly of a thiol-terminated org

2020-03-20 07:58:25

Cu surface molecular oxide terminated

责任者: Ganesan, P.G.;Kumar, A.;Ramanath, G. 单位: Dept. of Mater. Sci. & Eng., Rensselaer Polytech. Inst., Troy, NY, USA 来源出处: Applied Physics Letters(Appl. Phys. Lett. (USA)),2005/07/04,87(1):11905-1 摘要: We demonstrate the use of thiol-terminated organosilane to reduce the surface oxide and form a protective layer on Cu surfaces. The thiol termini of mercapto-propyl-trimethoxy-silane molecules reduce the copper oxide, and release disulfide- and sulfonate-terminated silanes. Unreacted mercaptosilanes and disulfides then assemble on the clean Cu surface forming a monolayer via chemisorption. The outward pointing methoxy groups react with other methoxysilane termini of sulfonated- and unreacted organosilanes, forming a molecular bilayer with Si-O-Si linkages between the two layers. These findings open up new possibilities for surface cleaning and passivating Cu interconnects with molecular nanolayers, and minimize surface-scattering-induced conductivity decrease in nanometer-thick Cu lines, without destructively etching the surface Cu oxide 关键词: chemisorption;copper;monolayers;organic compounds;protective coatings;reduction (chemical);self-assembly;surface chemistry;thiol-terminated organosilane;bilayer molecular assembly;surface oxide reduction;protective layer;mercapto-propyl-trimethoxy-silane molecules;disulfide-terminated silane;sulfonate-terminated silane;monolayer;chemisorption;methoxy group;methoxysilane termini;surface cleaning;passivation;molecular nanolayers;surface-scattering-induced conductivity;Cu