The enhanced voltage-dividing potentiometer for high-precision feature placement

2019-10-10 10:33:06

voltage test structure measurement errors

责任者: Allen, R.A.;Cresswell, M.W.;Ellenwood, C.H.;Linholm, L.W. 单位: Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA 来源出处: IEEE Transactions on Instrumentation and Measurement(IEEE Trans. Instrum. Meas. (USA)),1996/02/,45(1):136-41 摘要: Enhancements to the voltage-dividing potentiometer, an electrical test structure for measuring the spatial separations of pairs of conducting features, are presented and discussed. These enhancements reduce or eliminate systematic errors which can otherwise lead to uncertainties as large as several hundred nanometers. These systematic errors, attributed by modeling to asymmetries at certain intersections of conducting features in the test structure, are eliminated by modifications to the test structure and test procedures 关键词: feature extraction;integrated circuit measurement;measurement errors;nanotechnology;potentiometers;spatial variables measurement;voltage dividers;enhanced voltage-dividing potentiometer;feature placement metrology;electrical test structure;spatial separations;systematic errors;uncertainties;modeling;asymmetries;intersections;test structure;geometry dependent effects;overlay measurement