Nanostructured ZnO and ZAO transparent thin films by sputtering-surface characte

2019-09-28 08:54:49

film films oxide sputtering ZAO

责任者: Suchea, Mira;Christoulakis, S.;Moschovis, K.;Katsarakis, N.;Kiriakidis, G. 单位: Institute of Electronic Structure and Laser, Foundation for Research and Technology Hellas, 71110 Heraklion, Crete, Greece 来源出处: Reviews on Advanced Materials Science,2005,10(4):335-340 摘要: Zinc oxide (ZnO) and aluminum zinc oxide (ZAO) transparent thin films with different thickness were prepared by dc magnetron sputtering technique using metallic targets onto silicon and Corning glass substrates. Surface investigations carried out by Atomic Force Microscopy (AFM) and X-ray Diffraction (XRD) have shown a strong influence of deposition technique parameters on the film surface topography. Film roughness (RMS), grain shape and dimensions were found to correlate with the deposition parameters. The results revealed that the target composition has a radical effect on ZnO and ZAO film characteristics. XRD analysis revealed that all films grown by dc magnetron sputtered are polycrystalline regardless of target composition. The correlation of conductivity measurements with film RMS has shown a strong influence of surface on film electrical properties. Since the film surface characteristics are determined by the growth conditions, the gas sensing characteristics of these films are also strongly influenced and consequently may be enhanced by the control of the film growth parameters. © 2005 Advanced Study Center Co. Ltd. 关键词: Zinc oxide;Nanostructured materials;Aluminum compounds;Deposition;Magnetron sputtering;Atomic force microscopy;X ray diffraction;Surface topography;Surface roughness;Grain size and shape;Composition effects;Electric conductivity measurement;Transparent thin films;Aluminum zinc oxide (ZAO);Dc magnetron sputtering technique