Efficient self-assembly of transition metal oxide nanoclusters on silicon substr

2019-09-01 17:02:17

Metal HCl clusters oxide nanoclusters

责任者: Cao, Linyou;Chai, Yang;Li, Pingjian;Shen, Zhiyong;Wu, Jinlei 单位: Department of Electronics, Peking University, Beijing 100871, China 来源出处: Thin Solid Films,2005,492(1-2):13-18 摘要: Self-assembled monolayers (SAMs) of nanoclusters ( less than or equal 10 nm) on silicon wafer have been prepared via simply immersing the substrate into a FeCl 3/HCl solution. The clusters are hydrous iron oxide resulting from the hydrolysis of FeCl3, and their deposition is driven by the electrostatic attraction between the clusters and the substrate, the surface groups of which are oppositely charged at suitable pH value. HCl is used to enhance the repulsive force among the clusters and cause them uniformly distributed; in this regard, it can be replaced by KCl, NH4Cl, or NH2 [Closed Circle] HCl. This result provides a general guidance to prepare self-assemblies of transition metal oxide nanoclusters onto silicon substrates and others with appropriate hydroxyl (-OH) groups. © 2005 Elsevier B.V. All rights reserved. 关键词: Silicon;Transition metals;Nanostructured materials;Self assembly;Hydrolysis;Electrostatics;pH effects;Nanoparticles;Transition metal oxide;Electrostatic interaction;Nanoclusters