Anomalous interfacial diffusion in immiscible metallic multilayers: A size-depen

2019-08-29 17:31:01

diffusion interfacial metallic dependent immiscible

责任者: Ouyang, G.;Wang, C.X.;Yang, G.W. 单位: State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics Science and Engineering, Zhongshan University, Guangzhou 510275, China 来源出处: Applied Physics Letters,2005,86(17):171914- 摘要: In order to gain a better understanding of the interfacial alloying in binary immiscible metallic mutilayers, we established a size-dependent kinetic model to address the diffusion that takes place at the interface in the immiscible metallic bilayer on nanoscale, and found an abnormal interfacial diffusion behavior when the diffusion length less than 2 nm. The nanosize-dependent diffusion coefficients of binary immiscible metals in bilayers were predicted on the basis of the proposed model. Taking the Cu-Ta multilayers as an example, we showed that these theoretical predictions are in agreement with experiments and computational simulations. © 2005 American Institute of Physics. 关键词: Multilayers;Copper;Tantalum;Interfaces (materials);Diffusion;Reaction kinetics;ULSI circuits;Microelectronics;Melting;Computer simulation;Interfacial diffusion;Interfacial alloying;Binary immiscible metallic multilayers;Melting temperature