Dry lithiation studies of nanostructured sputter deposited molybdenum oxide thin

2019-08-14 17:09:31

molybdenum films oxide deposited lithiation

责任者: Taj, A.;Ashrit, P.V. 单位: Thin Films/Photonics Research Group, Department of Physics, Universite de Moncton, Moncton, NB E1A 3E9, Canada 来源出处: Journal of Materials Science,2004,39(10):3541-3544 摘要: The nanostructured sputter deposited molybdenum oxide thin films was studied by dry lithiation method. The molybdenum oxide (MoO3) thin films were prepared on clean glass substrates by r.f.magnetron sputtering. It was observed that there exists an optimum thickness in sputter deposited MoO3 films, giving broadband and intense optical modulation. It was suggested that AFM structural study was used to get an idea of the reversible regime of lithium insertion and EC coloration. 关键词: Thin films;Molybdenum compounds;Nanostructured materials;Magnetron sputtering;Transition metal compounds;Electric fields;Electrochromism;Quartz;Ellipsometry;Lithium;Light modulation;Absorption;Heat treatment;Atomic force microscopy;Optical constants;Cathodic coloration;Lithium insertion;Optical evolution;Dry lithiation method